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Extreme ultraviolet (EUV) flare and post-chemical mechanical polishing (CMP) metal thickness are two main manufacturability concerns that introduce critical dimension distortions in nanometer process technology. Dummification, the addition of dummy patterns, is an effective technique to address the two concerns. However, while the two dummification objectives are competing in nature, existing works...
Equivalence checking and functional correction are important steps ensuring design correctness. Direct verification of large industrial designs is challenging and often requires a divide-and-conquer approach. The 2015 CAD Contest at ICCAD poses the challenge of large-scale equivalence checking and functional correction. This paper reports our work in the competition. An algorithm to identify cut-points...
With increasing circuit complexities, design bugs are commonly found in late design stages, and thus engineering change orders (ECOs) have become an indispensable process in modern VLSI design. Most prior approaches to the timing ECO problem are concerned about combinational logic optimization. In contrast, this paper addresses the problem in the sequential domain to explore more optimization flexibility...
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