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In plasma etching process, various physical and chemical mechanisms affect the feature profile evolution. The relative importance of these mechanisms is uncertain. In order to study the physics mechanism of surface etching process, a plasma etching modeling method is proposed, which combines optimization technique with simulation. This paper developed a cumulative GA with evaluated probability to...
In order to study the physics mechanism of surface etching process in low pressure plasmas, we propose a method to optimize etching yield model, which combines optimization technology with surface evolution algorithm. In plasma etching process, the surface effect of the ions are controlled by etch yield which may be measured by the elaborate experiment. But measuring tool or instrument affect measuring...
Surface-normal ultra-compact narrowband optical filters and broadband reflectors can all be realized via Fano resonances on patterned single layer silicon nanomembranes (SiNM) layers on SOI. Recently, we reported Fano filters transferred onto glass or flexible polyethylene terephthalate (PET) substrates, employing a low temperature wet-transfer process. Here we report demonstration of broadband reflectors...
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