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High‐resolution (10 nm), high‐areal density, high‐aspect ratio (>5), and morphologically complex nanopatterns are fabricated from a single conventional block copolymer (BCP) structure with a 70 nm scale resolution and an aspect ratio of 1, through the secondary‐sputtering phenomenon during the Ar‐ion‐bombardment process. This approach provides a foundation for the design of new routes to BCP lithography...
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