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Vanadium dioxide (VO2) thin films were fabricated on single crystal Si (100) substrates by sol–gel method, including a process of annealing a vanadium pentoxide (V2O5) gel precursor at different temperatures. The crystalline structure and morphology of the films were investigated by XRD, FE-SEM and AFM, indicating that the films underwent the grain growth, agglomeration and grain refinement process...
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