The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
Direct electrodeposition (ECD) process of copper film on ultra-thin molybdenum film is investigated in both copper sulfate - sulfuric acid (CuSO4 - H2SO4) acidic bath and copper sulfate - ethylenediamine (CuSO4 - En) neutral bath (pH=7.5). The neutral electrolyte containing 0.03M CuSO4 and 0.06M En was chosen to avoid excessive corrosion of Mo and introduction of other ions. The complexing effect...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.