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Silicon carbon nitride (SiCN) coatings are produced by plasma-enhanced chemical vapor deposition using hexamethyldisilane, N2, and H2 as precursors at various nitrogen flow rates (FN). X-ray diffraction data, Fourier transform infrared spectroscopy, x-ray photoelectron spectroscopy, adhesion, friction coefficient, abrasive wear resistance, and microprofiling of the film surface are used to characterize...
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