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We have studied the influence of the Al incorporation in the crystalline structure of ZrN thin films deposited by dc magnetron sputtering processes at low temperature. The incorporation of the aluminum in the films depends directly on the Ar/N 2 ratio in the gas mixture and the power applied to the aluminum cathode during the deposition. The chemical composition and the crystalline structure...
ZrN coatings have been grown in an rf sputtering deposition chamber, using different ratios of Ar/N 2 (5/1, 5/5, 1/5) in the reactive gas flow. After deposition, the coatings were thermally treated in a 500°C oxygen atmosphere, in order to test the thermal stability of the layers or the oxynitride formation. The chemical composition, surface roughness and structural, mechanical and tribological...
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