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We have studied the influence of the Al incorporation in the crystalline structure of ZrN thin films deposited by dc magnetron sputtering processes at low temperature. The incorporation of the aluminum in the films depends directly on the Ar/N 2 ratio in the gas mixture and the power applied to the aluminum cathode during the deposition. The chemical composition and the crystalline structure...
ZrN coatings have been grown in an rf sputtering deposition chamber, using different ratios of Ar/N 2 (5/1, 5/5, 1/5) in the reactive gas flow. After deposition, the coatings were thermally treated in a 500°C oxygen atmosphere, in order to test the thermal stability of the layers or the oxynitride formation. The chemical composition, surface roughness and structural, mechanical and tribological...
Novel CrTiAlN multilayered nanocomposite thin films have been developed. They consist of alternating CrN and TiAlN layers of 10–12nm individual thickness, up to a total thickness of 1–3μm. These coatings were grown on WC-Co insets and high-speed steel samples by simultaneous arc evaporation (physical vapour deposition, PVD) of pure Cr and Ti-Al alloy targets. Wear resistance of these coatings was...
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