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Thin films of tin(IV) oxide (SnO 2 ) of 100nm thickness were grown on silicon (100) matrices by electron beam evaporation deposition technique under high vacuum. The thicknesses of these films were monitored by piezo-sensor attached to the deposition chamber. Nanocrystallinity is achieved in these thin films by 100MeV Au 8+ using 1pnA current at normal incidence with ion fluences varying...
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