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We find that surface modification characteristics of TiO2 using N2 RF plasma are strongly dependent on the detailed composition of active species in the plasma and the afterglows. The surface nitriding of ALD-grown TiO2 films in pure N2 RF afterglows at room temperature (RT) is found to be more effective in the late afterglows than in the early afterglows. Adding a small fraction of H2 in N2 results...
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