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Deeply etched Bragg gratings were fabricated by focused ion beam (FIB) milling in KGdxLu1–x(WO4)2:Yb3+ to obtain photonic cavity structures. By optimizing parameters such as dose per area, dwell time and pixel resolution the redeposition effects were minimized and grating structures more than 4 µm in depth with an improved sidewall angle of ∼5° were achieved. Fabry‐Perot microcavities were defined...
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