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Nanostructured zirconium (Zr)-doped vanadium oxide (VOx) films were prepared at low temperature on glass substrates by reactive direct current magnetron sputtering followed by in-situ annealing process. The effect of Zr content on the chemical composition, structure, morphology and metal–semiconductor transition properties of the deposited films was investigated systematically. It was found that Zr...
Nanostructured vanadium oxide (nano-VO x ) films were prepared on indium-tin oxide (ITO) glass substrate at low temperature by means of direct current (DC) reactive magnetron sputtering from pure vanadium target in Ar + O 2 atmosphere. Field emission scanning electron microscope (SEM) reveals that the VO x film is composed of spheroidal nanoparticles whose diameters are in...
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