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Resists are important multicomponent system require in microelectronic industry for fabrication of integrated circuit (IC) devices. The current high end IC (integrated circuit) technology node in manufacturing is 20 nm and looking toward 16 and 10 nm nodes to fulfil market demand. A series of chemically amplified resists (CARs) based on co and terpolymers of 4-hydroxystyrene (HOST), 2-ethyl-2-adamantyl...
The incorporation of photoacid generator (PAG) functional groups directly into the resist resin polymer backbone has shown improved lithographic performance in achieving high resolution, high sensitivity, and low line edge roughness (LER) simultaneously in chemically amplified resists. However, the effect of direct PAG incorporation into the resist polymer on the reactive ion etch (RIE) performance...
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