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Investigations have been undertaken on the process of boriding by pulsed-DC plasma-assisted chemical vapor deposition technique (PACVD). The substrate material was 42CrMo4 steel. Boriding agent was trimethylborate [B(CH 3 O) 3 ]. The flow rates of Ar and H 2 were 2700 ml/min and 540 ml/min, respectively, the total pressure in chamber during plasma boriding process was 800 Pa,...
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