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Nanocrystalline titanium films were deposited at ultra-high current density by a direct-current closed-field unbalanced magnetron sputtering technique. The structures and properties of the films were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), atomic force microscopy (AFM) and nanoindentation microscratch. The Ti film deposited...
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