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An overall lithography simulation has become an essential factor for semiconductor manufacturing, etching is a fatal process in the integrate circuit manufacture. Integrate circuit simulation is an important assistant method. This paper brings forward a math model of integrated circuits etching process and digitalizes the model, which is suited to 3D lithography environment and can be simulated through...
Embed system plays an important role in our daily life, among which SoC is a key part. With the development of SoC, the complexity of Photolithography increases sharply. Dimension reduction to assist design is very essential for the photolithography simulation in order to display large scale simulation data. In this paper, an approach to reduce data dimension of the simulation results is proposed...
In this paper, it presents a transformation and expansion formulation for the original two-dimensional model of a simple etching. And this paper proposes a new mathematical model that is suitable for three-dimensional integrated circuit etching process. Further, In order to simulate a calculating process of etching with digital computers, then it gives the correspondingly discretized equations for...
This paper proposes an annealed particle swarm optimization based particle filter algorithm for articulated 3D human body tracking. In our algorithm, a sampling covariance and an annealing factor are incorporated into the velocity updating equation of particle swarm optimization (PSO). The sampling covariance and the annealing factor are initiated with appropriate values at the beginning of the PSO...
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