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In this paper, we demonstrate using extensive TCAD simulations that low frequency noise behavior is significantly different in presence of halo implants. The study of the noise behavior is extended to source side halo, drain side halo, symmetric halos and uniformly doped devices for different doping and length of the halo regions. Our study shows that source side halo region is responsible for the...
A compact model has been developed to capture the variability of flicker noise resulting from the reduction in size of state of the art MOSFETs. The underlying physics of flicker noise in small area MOSFETs has been verified by two means: Monte Carlo simulation and analytic modeling. The statistical distribution of flicker noise is reported for the first time, supported by experimental data from two...
It is shown for the first time that HfSiON gate dielectric thickness has a strong impact on the flicker (1/f) noise of devices with Lg < 1mum. We have developed a simple model for both gate length (Lg) and HfSiON thickness dependences of N-FET flicker noise, based on excess traps at the gate-edges. P-FET noise does not exhibit such strong dependences. Scaling of future analog devices with high-k...
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