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Recently, source and mask optimization (SMO) has been proposed as an effective solution to help extending the life time of conventional 193 nm lithography. However, SMO is very computationally intensive. To mitigate this issue, we propose a highly effective and efficient method for source optimization in this paper. Based on the gray-level pixel based source representation, the gradient of the cost...
A robust pixel-based optimization algorithm is proposed for mask synthesis of inverse lithography technology (ILT) to improve the resolution and pattern fidelity in optical lithography. Result shows that the final image fidelity is almost independent of the initial condition. To demonstrate the robustness of the algorithm, six typical desired mask patterns and two mask technologies are applied in...
Resolution enhancement techniques (RETs) have become indispensable for the sub-wavelength optical lithography. Inverse lithography technology (ILT) is one kind of RETs, which attempts to consider the mask synthesis as an inverse problem and compute the optimum mask by using the entire area of the design pattern with a rigorous mathematical approach. Doubledipole lithography (DDL) uses two orthogonal...
An efficient algorithm based on the pixel-based mask representation is proposed for fast synthesis of model-based inverse lithography technology (ILT) to improve the resolution and pattern fidelity in optical lithography. This new algorithm reduces N2 intensity computations to three (3) equivalent intensity computations per iteration, where N2 is the total number of pixels in a mask. This algorithm...
An efficient algorithm based on the pixel-based mask representation is proposed for fast synthesis of model-based inverse lithography technology (ILT) to improve the resolution and pattern fidelity in optical lithography. This new algorithm uses perturbation method to reduce N2 intensity computations to only three (3) equivalent intensity computations, where N2 is the total number of pixels in a mask...
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