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In this study, UV-LED (ultraviolet light emitting diode) is developed for photolithography industry. Since the accuracy of the degree of cross linking and sidewall profile could be affected by intensity of UV light dosage, this research proposes optical design and fabrication of freeform lens with reflector coated on the light source element of UV-LED for exposure systems. Based on the law of conservation...
This UV LED lighting technology developed in this study is expected to be applied to photolithography industry. Since the accuracy of the degree of cross linking and sidewall profile could be affected by intensity of UV light dosage, this research proposes optical design and fabrication of free-curved lens for light source element of UV LED for exposure machines. In this study, the optical intensity...
The effect of variable micropattern for an advanced compound optical film was investigated. This compound optical film was made by using Lithographie galvanoformung abformung (LIGA)-like process. The multi-step electroforming with micro-void embedded Polydimethylsiloxane (PDMS) was developed. This work presents many innovative processes, such as the homemade gray scale mask to fabricate variable size...
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