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Optyczne właściwości cienkich półprzewodnikowych warstw NiO wytwarzanych za pomocą reaktywnego magnetronowego rozpylania katodowego zbadano pod kątem transmisji optycznej. Określono szerokość przerwy energetycznej w zależności od warunków wzrostu warstwy. Elektryczne parametry warstw zmierzono metodą Hall'a bezpośrednio po osadzaniu oraz po procesach wygrzewania w tlenie i argonie w zakresie temperatur...
Films of transparent semiconductors are widely studied and developed because of high potential applications in electronics in last decade. Our work concerns the properties of NiO films fabricated by RF magnetron sputtering. Electrical and optical parameters of the films were characterized using Hall and transmittance measurements, respectively. P-type conductivity of as-deposited films and after annealing...
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