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In this work structural properties of TiO2 thin films doped with different amounts of Nd have been presented. Thin films were deposited on silicon substrates using high energy reactive magnetron sputtering process and for the measurements TiO2 doped with 0.84 at. % and 8.51 at. % of Nd have been selected. Diversification of the thin film surface was investigated using atomic force microscope. The...
In this paper nanocrystalline thin films of TiO2 doped with Tb have been investigated. Thin films were deposited on different (silicon and glass) substrates using modified magnetron sputtering method named High Energy. Structural properties were examined by X-Ray Diffraction (XRD) method. The results have shown, that phase and average crystallites size of prepared thin films were determined by the...
In this work, influence of magnetron sputtering parameters on structural properties of TiO2 thin films has been outlined. Titanium dioxide thin films were deposited on silicon substrates using reactive magnetron sputtering method. Structural properties of deposited thin films were investigated by X-ray Diffraction (XRD), while diversification of surface topography was examined using Atomic Force Microscopy...
Doping of TiO2 with various metal ions can modify its different properties. In this work, structural properties of transparent Tb-doped TiO2 thin films have been outlined. Thin films were deposited by high energy reactive magnetron sputtering (HE RMS) from metallic Ti-Tb target on Si and SiO2 substrates. Thin films were investigated by means of energy disperse spectrometry (EDS), X-ray diffraction...
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