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A pure‐phase, unstrained and epitaxial α‐Fe2O3 film of thickness 250 nm has been fabricated by reactive rf sputtering over c‐Al2O3 substrate with nominal average surface roughness of 0.71 nm. Field induced spin‐reorientation temperature (TSR) and temperature dependent spin‐reorientation field (HSR) have been investigated. A linear relationship in the result has been found with ∂TSR/∂HSR equal to...
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