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Oxide breakdown has become an increasingly pressing reliability issue in modern very large scale integration design with ultrathin oxides. The conventional guard-band methodology assumes uniformly thin oxide thickness, resulting in overly pessimistic reliability estimation that severely degrades system performance. In this paper, we present the use of limited post-fabrication measurements of oxide...
As technology is aggressively scaled, nano-regime VLSI designs are becoming increasingly susceptible to process variations. Unlike pre-silicon optimization, post-silicon techniques can tune the individual die to better meet the power-delay constraints. This paper proposes a variation-aware methodology for the simultaneous gate sizing and clustering for post-silicon tuning with adaptive body biasing...
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