The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
In this paper, we have done a comprehensive study of the junction anneal strategy (by spike and/or laser) for advanced technology nodes with Hk/MG and high-k capping film to control the eWF. It has been shown that a low long channel Vth is easily achievable with anneal sequence optimization. In particular with the help of laser which creates more dipoles for NMOS case with La-based capping. But also...
This paper presents for the first time the successful integration of laser-only annealing in a high-k / metal gate first process flow with functional ring oscillators. The process has been optimized to limit defect creation, reduce poly-silicon resistance and obtain good capping/high-k intermixing. EOT reduction with less eWF roll-off, excellent device scalability without performance penalty and Vth-matching...
We are reporting for the first time on the use of simple resist-based selective high-k dielectric capping removal processes of La2O3, Dy2O3 and Al2O3 on both HfSiO(N) and SiO2 to fabricate functional HK/MG CMOS ring oscillators with 40% fewer process steps compared to our previous report [1]. Both selective high-k removal (using wet chemistries) and resist strip processes (using NMP and APM) have...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.