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In this paper, the improved field-effect diode (FED) has been characterized and modeled in 45 nm silicon-on-insulator (SOI) technology. It has been experimentally shown to be suitable for pad-based local clamping under normal supply voltage (Vdd) range (below 1 V) in high-speed integrated circuits. ESD protection capabilities are investigated using very fast transmission line pulse (VF-TLP) tests...
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