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We fabricate a Silicon thin film by metal-assisted chemical etching (MacEch). Generally, it is hard to make a large size silicon thin film. Here we demonstrate a low cost and simple method to lift off the silicon thin film from silicon wafer. Besides, the substrate is reusable, so we can fabricate many thin films from the same wafer. Thus, this method is competitive for commercial applications.
We report the increasing in average external quantum-efficiency (EQE) of 11% on the top-cell of GaAs-based triple-junction solar-cell due to current matching using a graded-index SiO2-nano-pillars sub-wavelength/SiO2/TiO2 AR-coating by CF4-RIE etching with Ag-nanoparticles mask.
Si nanostructures are promising materials for future photovoltaic applications. To date the Si nanostructures are mainly formed on particular substrates or at high temperatures, greatly limiting their application flexibility. Here we report a two-step metal-assisted etching technique for forming vertically aligned Si nanohole thin films on bulk Si wafers at room temperature. The Si nanohole thin films...
A technique applying the homogenized KrF excimer laser reformation to fabricate Si cylindrical profile is presented. High-power excimer laser was used to illuminate high-aspect-ratio Si ridges which were fabricated using typical lithography and etching process. The Si ridges were then melted and reshaped to cylinders due to surface tension. The structure can be further preceded by thermal oxidation...
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