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In this work, we will present results showing a feasibility of a MEMS microphone, based on AMS 0.35 μm CMOS standard process, with only one step of a sacrificial SiO2 maskless etching on the substrate front-side. The microphone design, modeling and simulated performance will be studied. Fabrication of test structures obtained with a SiO2 etching will be shown as well as characterizations of these...
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