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In this paper new magnetron sputtering system for multilayers deposition has been presented. The system allows sputtering of different materials from 4 targets in low pressure of working and reactive gas (oxygen, argon, oxygen + argon). Manufactured structures can be build from films, which have gradient concentration of dopant. Also the doping process can be performed with high precision in continuous...
In this work nanocrystalline titanium dioxide thin films doped with Eu have been presented. Structural investigation results have shown that amount of Eu in TiO2 matrix has meaningful influence on properties of the thin films, particularly on TiO2 phase and grain sizes. Our measurements have shown that Eu increases photocatalytic activity of TiO2. Eu also has high influence on adsorption of OH- groups...
In this work structural, electrical and antistatic properties of TiO2 thin films doped with different amount of V have been presented. It was shown that the doped thin films are semiconductors in room temperature. The amount of V dopant has a great influence on resistivity of prepared thin films similarly as annealing at 400degC. The time of static charge dissipation from the thin films surface dropped...
Doping of TiO2 with various metal ions can modify its different properties. In this work, structural properties of transparent Tb-doped TiO2 thin films have been outlined. Thin films were deposited by high energy reactive magnetron sputtering (HE RMS) from metallic Ti-Tb target on Si and SiO2 substrates. Thin films were investigated by means of energy disperse spectrometry (EDS), X-ray diffraction...
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