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We have synthesized diamond films by plasma assisted chemical vapor deposition on silicon substrates. The roughness and dynamic critical exponents of these films have been measured using an atomic force microscope. Our experimental results are compared with the theoretical predictions of Kardar et al. [9] (M. Kardar, G. Parisi, Y.C. Zhang, Phys. Rev. Lett. 56 (1986) 889).
Reliable metallization schemes for chemical vapor deposited diamond are critical for expanding the use of diamond components in electronics and optics. We present here the results of our investigation of several metallization schemes produced by cathodic arc deposition. The deposition process also allows the control of the metal ion energy, and this is used to promote good adhesion between film and...
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