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In Plasma Based Ion Implantation (PBII) using a titanium vacuum arc of DC 70 A with a pulse voltage of −10 to −40 kV/20 μs, titanium nitride (TiN) films were coated on a silicon substrate (p-type, (100)) and titanium ions were simultaneously implanted in the substrate. XPS results indicate that Ti ions are implanted inside the silicon substrate. From XRD patterns, the crystal orientation of the film...
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