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Nitridation at low-energy, high-flux implantation-diffusion has been performed on pure Ni and Ni-20at.% Cr substrates in order to study their high-temperature oxidation behavior at 700 and 800 o C in synthetic air. The nitridation treatment leads to significant sputtering on pure Ni, but no implanted nitrogen has been detected. However, the Ni-20at.% Cr substrates are able to incorporate nitrogen,...
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