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Focusing on the challenges of wafer fabs with multiple tools and high-mix products, this study aims to propose a decision-based virtual metrology framework to reduce the metrology cost and enhance productivity. An empirical study was conducted in a leading semiconductor company in Taiwan to validate the effectiveness of proposed approach for controlling overlay errors in lithography processes while...
• Through the proposed method, the streamlined high-priority lots can be obtained with maximum information coverage and best KPI, and the model has good ability of abnormal discrimination. • Cost reduction by catching more abnormal events • Decreasing business impact to improve customer's satisfaction
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