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Transparent and conductive Zn‐In‐Sn‐O (ZITO) amorphous thin films have been deposited at room temperature by the rf magnetron co‐sputtering of ITO and ZnO targets. Co‐sputtering gives the possibility to deposit multicomponent oxide thin films with different compositions by varying the power to one of the targets. In order to make ZITO films with different Zn content, a constant rf power of 50 W was...
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