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A top‐down approach for controlled tailoring of graphene nanostructures with zigzag edges is presented. It consists of two key steps: artificial defect patterning and hydrogen‐plasma etching. With this approach, various graphene nanostructures with sub‐10 nm features and identical zigzag edges are reliably achieved. This approach shows great promise for making future graphene devices or circuits....
A highly controllable, dry, anisotropic etching technique for graphene sheets has been achieved using hydrogen plasma etching. Zigzag edge formation was achieved by starting the etching at edges and defects and depends strongly on crystallographic orientation of the graphene. This dry, anisotropic etching approach combined with the standard lithographic technique is ideal for scalable graphene tailoring...
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