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We have shown recently that the formation of C54-TiSi 2 is enhanced by using a thin refractory metal layer of either Mo or Ta deposited between Ti films and Si substrates, through the formation of a template layer composed of (Mo,Ti)Si 2 or TaSi 2 . We show in this paper that the interposed layer also influences the morphology and thermal stability of the TiSi 2 films...
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