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An optically transparent p–n heterojunction device consisting of p-NiO and n-ZnO thin films was fabricated by r.f. sputtering method. The structural and optical properties of the p-NiO/n-ZnO heterojunction were characterized by X-ray diffraction (XRD), UV–visible spectroscopy, Hall effect measurement, and J–V photocurrent measurements. The XRD shows that ZnO films are highly crystalline in nature...
All oxide-based, nano-transparent p-n heterojunction device consisting of p-NiO and n-ZnO thin films was fabricated by r.f. sputtering method. The structural and electric properties of the p-NiO/n-ZnO heterojunction were characterized by X-ray diffraction (XRD), UV-visible spectroscopy, Hall measurement, and photocurrent measurements. The XRD shows that ZnO films are highly crystalline in nature with...
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