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A two-step, metal-assisted, electroless etching technique based on the sputtering of silver particles is described, using phosphorus silicate glass, doping, and screen printing processes to fabricate photovoltaic devices. Si-NW arrays on pyramid surfaces show a low reflectivity of ∼1.11%, while the average length of the Si-NW arrays is ∼375nm, with an aspect ratio of ∼5.4. Superior photovoltaic characteristics...
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