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A new lithography system to fabricate high‐aspect‐ratio 3D microstructures was developed at the NewSUBARU synchrotron radiation facility (University of Hyogo, Japan). The X‐ray beam generated by this system has high parallelism (horizontal and vertical divergence angles of 278 µrad and 14 µrad, respectively) and high photon flux (31 mW mm−2 at a beam current of 300 mA). The high photon flux and exposure...
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