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A conductive atomic force microscopy (C-AFM) has been used to study conductivity and electrical degradation of ultrathin (4nm) Hf- and Al-doped Ta 2 O 5 at the nanometer scale. The hardness testing has been also performed using the force measuring ability of the AFM. Since the size of the analyzed area is very small, features which are not visible by macroscopic tests are observed:...
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