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The effects of microstructure and surface terminal bonds of SiO 2 aerogel films on dry etching were investigated using Ar, SF 6 , and C 2 F 6 plasma gases. With Ar plasma etching, physical effect of ion bombardment on porous film was found. In residue-free SF 6 plasma etching, reactive etchant transport and high-mass ion bombardment were observed. With C ...
In the down-scaling trend of ultra large scaled integration, SiO2 aerogel film can be a promising material for intermetal dielectric with inherent low dielectric constant. A TEOS-derived SiO2 aerogel film by spin-coating and supercritical drying has high porosity and large internal surface area which contains the chemical species on the internal surface, such as organic groups, hydroxyl groups, and...
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