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A corrosion mechanism is proposed for Al 3 Mg 2 , based on electrochemical tests, XPS, and depth profiling using XPS and ToF-SIMS. After short (∼2min) solution exposure, the surface consists of a surface film above dealloying. The dealloying is attributed to selective Mg dissolution and the surface rearrangement of Al into islands, although the metallic Al could alternatively be formed...
An XPS investigation was carried out of the surface films, formed by exposure to ultrapure water, on mechanically ground Mg and the two Mg–Al intermetallic compounds: Al 3 Mg 2 and Mg 17 Al 12 . The mechanically ground Mg surface had a film of MgO at the Mg metal surface covered by a Mg(OH) 2 layer, formed by the reaction of the MgO with water vapour in the...
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