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NiO-V 2 O 5 composite films have been fabricated by 355nm pulsed laser reactive deposition using mixed metallic Ni and V targets with different molar ratios. The optimal deposition conditions of NiO-V 2 O 5 composite films are found to be the substrate temperature of 300 o C and 100mTorr O 2 ambient. X-ray diffraction (XRD) and scanning electron microscopy...
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