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Thin films of tungsten trioxide (WO 3 ) have been prepared by RF reactive magnetron sputtering of tungsten target at different substrate temperatures in the range 303–673K and at fixed oxygen partial pressure of 6×10 −2 Pa and sputter pressure of 4Pa. The effect of substrate temperature on the structural, morphological, optical and electrochromic properties of WO 3 films was...
Thin films of pure and molybdenum (Mo)-doped tungsten trioxide (WO3) were deposited on indium tin oxide (ITO)-coated glass and Corning glass substrates by RF magnetron sputtering technique. The effect of Mo doping on the structural, morphological, optical and electrochromic properties of WO3 films was studied systematically. The energy dispersive X-ray analysis (EDAX) revealed that the films consist...
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