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A method of chemical flip-chip bonding by electroless deposition process was proposed. This method positively utilizes preferential bridge deposition between metal pads in electroless Ni-B deposition and enables bump-less interconnect without loading and/or heating at lower temperature (60degC). Details of the deposition behavior for interconnection were investigated using fundamental test chips....
A chemical flip-chip bonding method by electroless plating process has been developed. This method positively utilizes so-called "bridge" phenomenon between metal pads in electroless Ni-B plating, and enables bump-less interconnect without loading and/or heating at lower temperature (60??C). The interconnect behavior was examined using test chips and substrates with various pad-to-pad configurations...
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