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High‐throughput production of high‐temperature capacitor films is realized by Qi Li, Jinliang He, Qing Wang, and co‐workers in article number 1805672 through fast and continuous deposition of a nanoscale thin layer of an insulating barrier using atmospheric‐pressure plasma‐enhanced chemical vapor deposition. This approach should be adaptable to the industrial extrusion method for highly productive...
High‐temperature capability is critical for polymer dielectrics in the next‐generation capacitors demanded in harsh‐environment electronics and electrical‐power applications. It is well recognized that the energy‐storage capabilities of dielectrics are degraded drastically with increasing temperature due to the exponential increase of conduction loss. Here, a general and scalable method to enable...
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