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Hydrogenated amorphous silicon nitride (a:SiN:H) films produced by CO 2 and ArF laser-induced CVD in parallel configuration using silane/ammonia or disilane/ammonia gas mixtures were subjected to room-temperature multiple pulse ArF excimer laser irradiations in an inert gas atmosphere. Modifications in their chemical composition, refractive index, and surface morphology were systematically...
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