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A typical 6-layered metal-dielectric film structure of SiO2 (57.3 nm)/Cr (2.9 nm)/SiO2 (72.9 nm)/Cr (6.6 nm)/SiO2 (57.6 nm)/Cu (>100.0 nm) was designed and fabricated by magnetron sputtering. It showed a high solar absorption of about 95.8% in the wavelength range of 250–2000 nm, a low thermal emittance of about 0.104 at 600 K and good thermal stability at 673 K after annealing for 12 h in vacuum...
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