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In this work we study the magnetic properties of 4-nm-thick permalloy films deposited into flat elliptical holes with an aspect ratio of 2:1 and short axis ranging from 2000 down to 70nm. The holes are patterned into 50- and 200-nm-thick SiO 2 dielectric by e-beam lithography. The magnetization switching characteristics of the embedded magnetic elements were probed by localized magneto-optical...
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