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We have developed a lateral standard on the nanometre scale for use with high-resolution optical microscopy techniques [U. Huebner, in: Proceedings of the 5th International Euspen Conference, 2005, pp. 185–188; U. Huebner, in: Optical Fabrication Testing, and Metrology II, Proc. SPIE 5965 (2005) 59651W]. The so-called nanoscale linewidth/pitch standard contains structures in the submicron- and sub-100nm...
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