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Strain-induced, self-assembled iron silicide nanostructures were grown on Si(001) substrate by reactive deposition epitaxy. The phases and structures were characterized by scanning- and transmission electron microscopy, atomic force microscopy, and by Fourier transform infrared spectroscopy. The electrical characteristics were investigated by I–V and C–V measurements and the point defects were measured...
Iron-silicides were grown on Si by reactive deposition epitaxy method and by conventional solid phase reaction. The morphology of silicides was investigated by optical microscopy, scanning electron microscopy and by atomic force microscopy. The phases formed were identified by X-ray diffraction. The thickness of the evaporated Fe films ranged from 1.5 to 30 nm and the in situ heat treatments were...
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